Analysis of minor additives and polymerin used-stripper using pyrolysis-gas chromatography/mass spectrometry and electrospray mass spectrometry

Bulletin of the Korean Chemical Society

Volumn 30, Issue 2, 2009, Pages 368-372

  Koo, Jeongboon ^a   Park, Chang Hyun ^b   Han, Cheol ^b   Na, Yun Cheol ^a  

^a Korea Basic Science Institute (KBSI)   (South Korea)

^b Dae Won F and C Inc   (South Korea)

Author keywords

Electrospray ionization; Novolac; Photoresist; Pyrolysis; Stripper

Indexed keywords

ALKYLATION; CHEMICAL ANALYSIS; CHROMATOGRAPHIC ANALYSIS; COPOLYMERS; ELECTROSPRAY IONIZATION; GAS CHROMATOGRAPHY; IONIZATION OF GASES; ISOMERS; MASS SPECTROMETRY; METHYLATION; OLIGOMERS; PHOTORESISTS; PYROLYSIS;

ANALYTICAL METHOD; CHARACTERISTIC PEAKS; ELECTROSPRAY MASS SPECTROMETRY; NOVOLAC; PYROLYSIS-GAS CHROMATOGRAPHY/MASS SPECTROMETRY; REPEAT UNITS; STRIPPER; STRUCTURAL DETERMINATION;

POLYMERS;

EID: 75849119244     PISSN: 02532964     EISSN: 12295949     Source Type: Journal    
DOI: 10.5012/bkcs.2009.30.2.368     Document Type: Article

References (31)

1. Levinson, H. J. Principles of Lithography; SPIE Press: Washington, 2001.
2. Deforest, W. S. Photoresist: Materials and Processes; McGraw-Hill Book Co., Inc.: New York, 1975.
3. Hirose, K.; Shimada, H.; Shimomura, S.; Onodera, M.; Ohmi, T. J. Electrochem. Soc. 1994, 141, 192.
4. Saito, R.; Ichinohe, Y.; Kudo, M. In Secondary Ion Mass Spectrometry SIMS XI; Gillen, G.; Lareau, R.; Bennet, J.; Steve, F., Eds.; Wiley: Chichester, 1998; p505.
5. Saito, R.; Ichinohe, Y.; Kudo, M. Applied Surface Science 1999, 142, 460.
6. Nwmoto, H.; Inomat, K.; Ota, T.; Yumoto, Y.; Miura, T.; Chawanya, H. Polymer Preprints 1992, 41, 2800.
7. Okuyama, Y.; Hashimoto, Y.; Koguchi, T. J. Electrochem. Soc. 1978, 125, 1293.
8. Wang, F. C. W.; Lohse, D. J.; Champman, B. R.; Harrington, B. A. J. Chromatogr. A 2007, 1138, 225.
9. Wampler, T.; Zawodny, C.; Mancini, L.; Wampler, J. J. Anal. Appl. Pyrol. 2003, 68/69, 25.
10. Evans, S. J.; Haines, P. J.; Skinner, G. A. J. Anal. Appl. Pyrol. 2000, 55, 13.
11. Mao, S.; Ohtani, H.; Tsuge, S. J. Anal. Appl. Pyrol. 1995, 33, 181.
12. Asperger, A.; Engewald, W.; Wagner, T. J. Anal. Appl. Pyrol. 1999, 49, 155.
13. Choi, S. S. J. Anal. Appl. Pyrol. 2002, 62, 319.
14. Jansson, K. D.; Zawondy, C. P.; Wampler, T. P. J. Anal. Appl. Pyrol. 2007, 79, 353.
15. Donner, M.; Kiesewetter, J.; Kaminsky, W. J. Anal. Appl. Pyrol. 2007, 80, 231.
16. Bart, J. C. J. J. Anal. Appl. Pyrol. 2001, 58/59, 3.
17. Herrera, M.; Matuschek, G.; Kettrup, A. J. Anal. Appl. Pyrol. 2003, 70, 35.
18. Wang, F. C. Y. J. Chromatogr. A 1999, 843, 413.
19. Odermatt, J.; Meier, D.; Leicht, K.; Meyer, R.; Runge, T. J. Anal. Appl. Pyrol. 2003, 68/69, 269.
20. Wang, F. C. Y. J. Chromatogr. A 2000, 883, 199.
21. Wang, F. C. Y. J. Chromatogr. A 2000, 886, 225.
22. Wang, F. C. Y.; Buzanowski, W. C. J. Chromatogr. A 2000, 891, 313.
23. Wang, F. C. Y. J. Chromatogr. A 2000, 891, 325.
24. Lee, J. G.; Lee, C. G.; Kwag, J. J.; Buglass, A. J.; Lee, G. H. J. Chromatogr. A 2005, 1089, 227.
25. Wanpler, T. P. J. Chromatogr. A 1999, 842, 207.
26. Stauffer, E. Sci. Justice 2003, 43, 29.
27. Knop, A.; Pilato, L. A. Phenolic Resins; Springer: Berlin, 1985.
28. Llompart, M. P.; Lorenzo, R. A.; Cela, R.; Pare, J. R. J.; Belanger, J. M. R.; Li, K. J. Chromatogr. A 1997, 757, 153.
29. Llompart, M. P.; Lorenzo, R. A.; Cela, R.; Li, K.; Belanger, J. M. R.; Pare, J. R. J. J. Chromatogr. A 1997, 774, 243.
30. Prokai, L. Int. J. Polym. Anal. Charact. 2001, 6, 379.
31. Nielen, M. W. F. Mass Spectrom. Rev. 1999, 18, 309.