SCOPUS 정보 검색 플랫폼

Applied Surface Science

Volumn 142, Issue 1, 1999, Pages 460-464

TOF-SIMS analysis of chemical state changes in cresol-novolak photoresist surface caused by O2 plasma downstream

(3) Saito, Reiko a,b Ichinohe, Yuji b Kudo, Masahiro b

a TOSHIBA CORPORATION (Japan)

b SEIKEI UNIVERSITY (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ADDITIVES; CHEMICAL ANALYSIS; COMPOSITION; DECOMPOSITION; ORGANIC POLYMERS; OXIDATION; OXYGEN; PLASMA APPLICATIONS; SECONDARY ION MASS SPECTROMETRY; SPECTRUM ANALYSIS; SURFACE PHENOMENA; VAPORIZATION;

CHEMICAL STATE CHANGES; CRESOL NOVOLAK PHOTORESIST;

PHOTORESISTS;

EID: 0032651352 PISSN: 01694332 EISSN: None Source Type: Journal
DOI: 10.1016/S0169-4332(98)00655-2 Document Type: Article

Times cited : (6)

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