Microwave plasma chemical vapor deposition of graphitic carbon thin films

Carbon

Volumn 48, Issue 5, 2010, Pages 1552-1557

  Marcinek, Marek ^a   Hardwick, Laurence J ^a   Zukowska, Grazyna Z ^b   Kostecki, Robert ^a  

^a LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

^b WARSAW UNIVERSITY OF TECHNOLOGY   (Poland)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRICAL CONDUCTIVITY; ELECTROMAGNETIC RADIATION; GRAPHITIC CARBONS; GRAPHITIZED CARBONS; LOW TEMPERATURES; MICROWAVE PLASMA CHEMICAL VAPOR DEPOSITIONS; ORGANIC PRECURSOR; SCANNING ELECTRONS; STRUCTURE AND MORPHOLOGY; THIN LAYERS; UNIFORM FILMS;

CHEMICAL VAPOR DEPOSITION; DEPOSITION; DOSIMETRY; ELECTRIC CONDUCTIVITY; ELECTROMAGNETIC WAVES; ELECTRON OPTICS; MICROWAVES; PLASMA DEPOSITION; RAMAN SPECTROSCOPY; SCANNING ELECTRON MICROSCOPY; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY;

CARBON FILMS;

EID: 75749152674     PISSN: 00086223     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.carbon.2009.12.052     Document Type: Article

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