Strain dependence of second-harmonic generation in silicon

Optics Letters

Volumn 35, Issue 3, 2010, Pages 273-275

  Schriever, Clemens ^a   Bohley, Christian ^a   Wehrspohn, Ralf B ^a,b  

^a MARTIN LUTHER UNIVERSITY HALLE WITTENBERG   (Germany)

^b FRAUNHOFER INSTITUTE FOR MECHANICS OF MATERIALS IWM   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ANALYTICAL MODEL; APPLIED STRAIN; APPLIED STRESS; BULK SILICON; CENTROSYMMETRIC; LATTICE STRUCTURES; NONLINEAR OPTICAL PROCESS; NONLINEAR PROCESS; NONLINEAR SUSCEPTIBILITIES; SECOND HARMONIC GENERATION; SECOND ORDERS; SECOND-ORDER NONLINEAR SUSCEPTIBILITY; STRAIN DEPENDENCE; STRAINED SILICON; SURFACE-SENSITIVE TECHNIQUE; THEORETICAL PREDICTION; THERMAL OXIDES;

HARMONIC GENERATION; MICROELECTRONICS; PHOTONIC DEVICES;

PHOTONICS;

EID: 75749142316     PISSN: 01469592     EISSN: 15394794     Source Type: Journal    
DOI: 10.1364/OL.35.000273     Document Type: Article

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