Robust Forests of Vertically Aligned Carbon Nanotubes Chemically Assembled on Carbon Substrates

Langmuir

Volumn 26, Issue 3, 2010, Pages 1848-1854

  Garrett, David J ^a   Fiavel, Benjamin S ^b   Shapter, Joseph G ^b   Baronian, Keith H R ^c   Downard, Alison J ^a  

^a UNIVERSITY OF CANTERBURY   (New Zealand)

^b FLINDERS UNIVERSITY   (Australia)

^c CHRISTCHURCH POLYTECHNIC INSTITUTE OF TECHNOLOGY   (New Zealand)

Author keywords

[No Author keywords available]

Indexed keywords

CARBON SUBSTRATES; CARBON SURFACE; DICYCLOHEXYLCARBODIIMIDE; ELECTRON TRANSFER RATES; ETHYLENE DIAMINE; POTENTIAL RANGE; PYROLYZED PHOTORESIST FILMS; REDOX PROBE; SLOW ELECTRONS; VERTICALLY ALIGNED CARBON NANOTUBE;

ATOMIC FORCE MICROSCOPY; CARBON FILMS; ORGANIC SOLVENTS; PHOTORESISTS; SCANNING ELECTRON MICROSCOPY; SINGLE-WALLED CARBON NANOTUBES (SWCN); SUBSTRATES; SURFACES; TETHERLINES;

CARBON NANOTUBES;

CARBON; SCANNING ELECTRON MICROSCOPY; SOLVENTS; SUBSTRATES; SURFACES;

EID: 75749093449     PISSN: 07437463     EISSN: None     Source Type: Journal    
DOI: 10.1021/la902575w     Document Type: Article

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