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Journal of Applied Physics

Volumn 107, Issue 2, 2010, Pages

Structure and giant magnetoresistance of granular Co-Cu nanolayers prepared by cross-beam pulsed laser deposition

(6) Jesche, A a,c Gorbunoff, A b Mensch, A a Stocker H a Levin, A A a Meyer, D C a

a DRESDEN UNIVERSITY OF TECHNOLOGY (Germany)

b Labor Konstruktiver Ingenieurbau (Germany)

c MAX PLANCK INSTITUTE FOR CHEMICAL PHYSICS OF SOLIDS (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ALLOY FILM; COBALT CONTENT; COHERENCE LENGTHS; COPPER GRAINS; ELECTRICAL TRANSPORT MEASUREMENTS; GRAIN SIZE; LAYER THICKNESS; NANO LAYERS; NON-COHERENT; SILICON SUBSTRATES; STRUCTURE TYPE; TEM; TEM IMAGES; THERMAL TREATMENT; WIDE-ANGLE X-RAY DIFFRACTION;

COBALT; COHERENT SCATTERING; DIFFRACTION; ELECTRIC RESISTANCE; GRAIN SIZE AND SHAPE; HEAT TREATMENT; HOLOGRAPHIC INTERFEROMETRY; MAGNETIC FIELD EFFECTS; MAGNETOELECTRONICS; PULSED LASER DEPOSITION; PULSED LASERS; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION; X RAY DIFFRACTION ANALYSIS;

GIANT MAGNETORESISTANCE;

EID: 75749089696 PISSN: 00218979 EISSN: None Source Type: Journal
DOI: 10.1063/1.3277023 Document Type: Article

Times cited : (11)

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