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Volumn 96, Issue 1, 2010, Pages

Manipulation of magnetism by electrical field in a real recording system

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC AND MAGNETIC FIELDS; ELECTRICAL FIELD; MAGNETIZATION REVERSAL PROCESS; NANOCOMPOSITE THIN FILMS; RECORDING MEDIUM; RECORDING PERFORMANCE; RECORDING SYSTEMS; SATURATION CURRENT; SPIN STAND; TIO; WAVE FORMS;

EID: 75749087185     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3276553     Document Type: Article
Times cited : (23)

References (13)
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  • 3
    • 14544293934 scopus 로고    scopus 로고
    • Composite media for perpendicular magnetic recording
    • DOI 10.1109/TMAG.2004.838075
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    • (2005) IEEE Transactions on Magnetics , vol.41 , Issue.2 , pp. 537-542
    • Victora, R.H.1    Shen, X.2
  • 4
    • 65249091913 scopus 로고    scopus 로고
    • APPLAB 0003-6951. 10.1063/1.3116623
    • T. J. Zhou, B. C. Lim, and B. Liu, Appl. Phys. Lett. APPLAB 0003-6951 94, 152505 (2009). 10.1063/1.3116623
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    • Zhou, T.J.1    Lim, B.C.2    Liu, B.3
  • 5
    • 33846639137 scopus 로고    scopus 로고
    • Electric field-induced modification of magnetism in thin-film ferromagnets
    • DOI 10.1126/science.1136629
    • M. Weisheit, S. Fähler, A. Marty, Y. Souche, C. Poinsignon, and D. Givord, Science SCIEAS 0036-8075 315, 349 (2007). 10.1126/science.1136629 (Pubitemid 46175509)
    • (2007) Science , vol.315 , Issue.5810 , pp. 349-351
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  • 7
    • 0041520973 scopus 로고    scopus 로고
    • Electrical manipulation of magnetization reversal in a ferromagnetic semiconductor
    • DOI 10.1126/science.1086608
    • D. Chiba, M. Yamanouchi, F. Matsukura, and H. Ohno, Science SCIEAS 0036-8075 301, 943 (2003). 10.1126/science.1086608 (Pubitemid 36994801)
    • (2003) Science , vol.301 , Issue.5635 , pp. 943-945
    • Chiba, D.1    Yamanouchi, H.2    Hatsukura, F.3    Ohno, H.4
  • 13
    • 65449155955 scopus 로고    scopus 로고
    • JAPIAU 0021-8979. 10.1063/1.3109243
    • C. K. Goh, Z. M. Yuan, and B. Liu, J. Appl. Phys. JAPIAU 0021-8979 105, 083920 (2009). 10.1063/1.3109243
    • (2009) J. Appl. Phys. , vol.105 , pp. 083920
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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.