Anisotropy graded FePt- TiO2 nanocomposite thin films with small grain size

Applied Physics Letters

Volumn 94, Issue 15, 2009, Pages

  Zhou, Tie Jun ^a   Lim, Boon Chow ^a   Liu, Bo ^a  

^a DATA STORAGE INSTITUTE   (Singapore)

Author keywords

[No Author keywords available]

Indexed keywords

CO-SPUTTERING; DIFFERENT SUBSTRATES; HARD LAYERS; ISOLATED GRAINS; NANOCOMPOSITE THIN FILMS; SMALL GRAIN SIZES; SOFT-LAYER THICKNESS; TIO2 THIN FILMS;

ANISOTROPY; NANOCOMPOSITES;

THIN FILMS;

EID: 65249091913     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3116623     Document Type: Article

References (23)

1. K. Z. Gao and H. N. Bertram, IEEE Trans. Magn. 38, 3675 (2002). 10.1109/TMAG.2002.804801
2. B. Lu, D. Weller, G. P. Ju, A. Sunder, D. Karns, M. Wu, and X. W. Wu, IEEE Trans. Magn. 39, 2240 (2003). 10.1109/TMAG.2003.815443
3. D. Weller and M. F. Doerner, Annu. Rev. Mater. Sci. 0084-6600 10.1146/annurev.matsci.30.1.611 30, 611 (2000).
4. J. -U. Thiele, L. Folks M. F. Toney, and D. K. Weller, J. Appl. Phys. 0021-8979 10.1063/1.368831 84, 5686 (1998).
5. T. Shima, T. Moriguchi, S. Mitani, and K. Takanashi, Appl. Phys. Lett. 0003-6951 10.1063/1.1432446 80, 288 (2002).
6. G. Choe, M. Zhang, B. R. Acharya, E. N. Abarra, and J. N. Zhou, IEEE Trans. Magn. 41, 3172 (2005). 10.1109/TMAG.2005.855283
7. Y. F. Xu, J. S. Chen, and J. P. Wang, Appl. Phys. Lett. 0003-6951 10.1063/1.1476706 80, 3325 (2002).
8. M. L. Yan, X. Z. Li, L. Gao, S. H. Liou, D. J. Sellmyer, R. J. M. van de Veerdonk, and K. W. Wierman, Appl. Phys. Lett. 0003-6951 10.1063/1.1621071 83, 3332 (2003).
9. T. Shima, K. Takanashhi, Y. K. Takahashi, and K. Hono, Appl. Phys. Lett. 0003-6951 10.1063/1.1794863 85, 2571 (2004).
10. Y. K. Takahashi, T. Ohkubo, M. Ohnuma, and K. Hono, J. Appl. Phys. 0021-8979 10.1063/1.1555895 93, 7166 (2003).
11. Y. C. Wu, L. W. Wang, C. H. Lai, and C. R. Chang, J. Appl. Phys. 0021-8979 10.1063/1.2838020 103, 07E140 (2008).
12. R. Victora and X. Shen, IEEE Trans. Magn. 41, 537 (2005). 10.1109/TMAG.2004.838075
13. J.-P. Wang, W. Shen, and J. Bai, IEEE Trans. Magn. 41, 3181 (2005). 10.1109/TMAG.2005.855278
14. H. Kronmüller and D. Goll, Physica B 319, 122 (2002). 10.1016/S0921-4526(02)01113-4
15. D. Suess, Appl. Phys. Lett. 0003-6951 10.1063/1.2347894 89, 113105 (2006).
16. A. Y. Dobin and H. J. Richter, Appl. Phys. Lett. 0003-6951 10.1063/1.2335590 89, 062512 (2006).
17. E. F. Kneller and R. Hawig, IEEE Trans. Magn. 0018-9464 10.1109/20.102931 27, 3588 (1991).
18. O. Hellwig, J. B. Kortright, K. Takano, and E. E. Fullerton, Phys. Rev. B 0163-1829 10.1103/PhysRevB.62.11694 62, 11694 (2000).
19. E. E. Fullerton, J. S. Jiang, M. Grimsditch, C. H. Sowers, and S. D. Bader, Phys. Rev. B 0163-1829 10.1103/PhysRevB.58.12193 58, 12193 (1998).
20. A. Y. Dobin and H. J. Richter, J. Appl. Phys. 0021-8979 10.1063/1.2714271 101, 09K108 (2007).
21. R. H. Victora and X. Shen, Proc. IEEE 0018-9219 96, 1799 (2008). 10.1109/JPROC.2008.2004314
22. X. W. Wu, K. Y. Guslienko, R. W. Chantrell, and D. Weller, Appl. Phys. Lett. 0003-6951 10.1063/1.1576501 82, 3475 (2003).
23. D. Suess, S. Eder, J. Lee, R. Dittrich, J. Fidler, J. W. Harrell, T. Schrefl, G. Hrkac, M. Schabes, N. Supper, and A. Berger, Phys. Rev. B 0163-1829 10.1103/PhysRevB.75.174430 75, 174430 (2007).