UV-induced refractive index change of sin film and its application to center wavelength trimming of vertically coupled microring resonator filter

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 43, Issue 8 B, 2004, Pages 5780-5784

  Naganawa, Toshiki ^a   Haeiwa, Hirofumi ^a   Kokubun, Yasuo ^a  

^a YOKOHAMA NATIONAL UNIVERSITY   (Japan)

Author keywords

Center wavelength trimming; Microring resonator; Sin; Uv irradiation; Uv induced index change; Wavelength filter

Indexed keywords

BANDWIDTH; CHEMICAL VAPOR DEPOSITION; OPTICAL FILTERS; OPTICAL RESONATORS; PHOTOLITHOGRAPHY; REFRACTIVE INDEX; SENSITIVITY ANALYSIS; SILICON; ULTRAVIOLET RADIATION;

CENTER WAVELENGTH TRIMMING; MICRORING RESONATORS; SIN; ULTRAVIOLET-INDUCED INDEX CHANGE; WAVELENGTH FILTERS;

THIN FILMS;

EID: 7544236300     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/JJAP.43.5780     Document Type: Conference Paper

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