Vertical resonant couplers with precise coupling efficiency control fabricated by wafer bonding

IEEE Photonics Technology Letters

Volumn 11, Issue 8, 1999, Pages 1003-1005

  Tishinin, D V ^a   Dapkus, P D ^a   Bond, A E ^a   Kim, I ^a   Lin, C K ^a   O'Brien, J ^a  

^a University of Southern California ^*  (United States)

Author keywords

[No Author keywords available]

Indexed keywords

BONDING; EPITAXIAL GROWTH; OPTICAL RESONATORS; OPTICAL WAVEGUIDES; SILICON WAFERS; SUBSTRATES; WAVELENGTH DIVISION MULTIPLEXING;

TRANSFER SUBSTRATES; VERTICAL RESONANT COUPLERS; WAFER BONDING;

WAVEGUIDE COUPLERS;

EID: 0032667209     PISSN: 10411135     EISSN: None     Source Type: Journal    
DOI: 10.1109/68.775327     Document Type: Article

References (7)

1. B. E. Little, S. T. Chu, H. A. Haus, J. Forresi, and J. P. Laine, "Microring resonator channel dropping filters," J. Lightwave Technol., vol. 15, pp. 998-1005, June 1997.
2. D. Rafizadeh, J. P. Zhang, S. C. Hagness, A. Taflone, K. A. Stair, and S. T. Ho, "Waveguide-coupled AlGaAs/GaAs microcavity ring an disk resonators with high finesse and 21.6-nm free spectral range," Opt. Lett., vol. 22, no. 16, pp. 1244-1246, Aug. 1997.
3. 2 micro-ring resonator optical add/drop filters," presented at the LEOS Annu. Meeting, 1996, paper CPD22-2.
4. D. V. Tishinin, I. Kim, A. E. Bond, C. K. Lin, and P. D. Dapkus, "Novel fabrication process for vertical resonant coupler with precise coupling efficiency control," presented at the LEOS 11th Annu. Meeting, 1998, Orlando, FL, Dec. 1998, paper TuK5.
5. B. Liu, A. Shakouri, P. Abraham, B. G. Kim, A. W. Jackson, and J. E. Bowers, "Fused vertical couplers," Appl. Phys. Lett., vol. 72, no. 21, pp. 2637-2638, 1998.
6. B. Liu, A. Shakouri, P. Abraham, Y. J. Chiu, S. Zhang, and J. E. Bowers, "Fused InP-GaAs vertical coupler filters," IEEE Photon. Technol Lett., vol. 11, pp. 93-95, Jan. 1999.
7. E. I. Chen, N. Holonyak, and J. M. Ries, "Planar disorder-defined and native-oxide-defined photopumped AlAs-AlGaAs superlattice minidisk lasers," J. Appl. Phys., vol. 79, no. 11, pp. 8204-8209, June 1996.