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Volumn 203, Issue 1-2, 2008, Pages 87-90

Effect of H2 dilution gas on the growth of ZrC during low pressure chemical vapor deposition in the ZrCl4 -CH4-Ar system

Author keywords

Dilution gas; LPCVD; Thermodynamic calculation; ZrC

Indexed keywords

DEPOSITION; DEPOSITION RATES; DILUTION; GASES; LOW PRESSURE CHEMICAL VAPOR DEPOSITION; ZIRCONIUM COMPOUNDS;

DILUTION GAS; EFFECT OF H; FACETED GRAINS; GAS SPECIES; GRAPHITE SUBSTRATE; LPCVD; PREFERRED ORIENTATIONS; THERMODYNAMIC CALCULATIONS;

VAPOR DEPOSITION;

EID: 75349102827 PISSN: 02578972 EISSN: None Source Type: Journal
DOI: 10.1016/j.surfcoat.2008.08.004 Document Type: Article

Times cited : (33)

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