Nanosphere lithography at the gas/liquid interface: A general approach toward free-standing high-quality nanonets

Chemistry of Materials

Volumn 22, Issue 2, 2010, Pages 476-481

  Li, Cheng ^a   Hong, Guosong ^a   Qi, Limin ^a  

^a PEKING UNIVERSITY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

BI-LAYER; COLLOIDAL CRYSTALS; FACILE FABRICATION; GAS/LIQUID INTERFACE; GENERAL APPROACH; HIGH QUALITY; HOLE SIZE; INORGANIC MINERAL; INTERFACIAL REACTIONS; LITHOGRAPHIC MASK; MATERIALS DEPOSITION; METAL SULFIDES; NANO PATTERN; NANO-NET; NANOARRAYS; NANOSPHERE LITHOGRAPHY; PHOTONIC PROPERTIES;

GOLD DEPOSITS; MONOLAYERS; NANOSPHERES;

COMMUNICATION CHANNELS (INFORMATION THEORY);

EID: 75249102011     PISSN: 08974756     EISSN: None     Source Type: Journal    
DOI: 10.1021/cm9031946     Document Type: Article

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