Adaptive optics for direct laser writing with plasma emission aberration sensing

Optics Express

Volumn 18, Issue 2, 2010, Pages 656-661

  Jesacher, Alexander ^a   Marshall, Graham D ^b   Wilson, Tony ^a   Booth, Martin J ^a  

^a UNIVERSITY OF OXFORD   (United Kingdom)

^b MACQUARIE UNIVERSITY   (Australia)

Author keywords

[No Author keywords available]

Indexed keywords

DIELECTRIC MATERIALS; FOCUSING; LIGHT; LIGHT MODULATION; LIGHT MODULATORS; OPTICAL SYSTEMS; REFRACTIVE INDEX; ULTRAFAST LASERS;

ABERRATION CORRECTION; CLOSED-LOOP ADAPTIVE OPTICS; DIRECT LASER WRITING; FEEDBACK SIGNAL; FOCAL REGIONS; FOCAL SPOT; OPTICAL ABERRATION; PLASMA EMISSION; PLASMA FORMATIONS; REFRACTIVE INDEX MISMATCH; SPATIAL LIGHT MODULATORS; SUPERCONTINUUM; ULTRAFAST LASER;

ABERRATIONS;

NANOMATERIAL;

ARTICLE; CHEMISTRY; EQUIPMENT; EQUIPMENT DESIGN; HEAT; INSTRUMENTATION; LASER; OPTICAL INSTRUMENTATION; RADIATION EXPOSURE; REFRACTOMETRY; REPRODUCIBILITY; SENSITIVITY AND SPECIFICITY; SURFACE PROPERTY; ULTRASTRUCTURE;

EQUIPMENT DESIGN; EQUIPMENT FAILURE ANALYSIS; HOT TEMPERATURE; LASERS; LENSES; NANOSTRUCTURES; OPTICAL DEVICES; REFRACTOMETRY; REPRODUCIBILITY OF RESULTS; SENSITIVITY AND SPECIFICITY; SURFACE PROPERTIES;

EID: 75249090433     PISSN: None     EISSN: 10944087     Source Type: Journal    
DOI: 10.1364/OE.18.000656     Document Type: Article

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