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Volumn 52, Issue 3, 2010, Pages 991-995

Galvanic coupling between copper and aluminium in a thin-layer cell

Author keywords

A. Alloy; A. Aluminium; A. Copper

Indexed keywords

A. ALLOY; A. ALUMINIUM; AL ALLOYS; ALUMINIUM ALLOYS; ALUMINIUM MATRIX; COPPER DISSOLUTION; CORROSION POTENTIALS; CU ELECTRODE; ELECTROCHEMICAL QUARTZ CRYSTAL MICROBALANCE; EXPERIMENTAL SETUP; GALVANIC CORROSION; GALVANIC COUPLING; INTER-METALLIC PARTICLE; MICROMETER RANGES; SCANNING ELECTROCHEMICAL MICROSCOPES; THIN ELECTROLYTE LAYER; THIN LAYERS; THIN-LAYER CELLS;

EID: 75049084727     PISSN: 0010938X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.corsci.2009.11.023     Document Type: Article
Times cited : (46)

References (24)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.