Ruthenium wet etch on 200mm MEMS wafers with sodium hypochlorite

ECS Transactions

Volumn 25, Issue 5, 2009, Pages 329-336

  Segaud, R ^a   Gabette, L ^a   Louveau, O ^b   Besson, P ^b  

^a CEA LETI   (France)

^b STMICROELECTRONICS   (France)

Author keywords

[No Author keywords available]

Indexed keywords

HYDROMETALLURGY; RUTHENIUM; SEMICONDUCTOR DEVICE MANUFACTURE; SEMICONDUCTOR DEVICES; SODIUM; WET ETCHING;

CHEMICAL MIXTURES; CONTACT MATERIAL; MEMS TECHNOLOGY; SINGLE WAFER; SODIUM HYPOCHLORITES;

SILICON WAFERS;

EID: 74949088991     PISSN: 19385862     EISSN: 19386737     Source Type: Conference Proceeding    
DOI: 10.1149/1.3202670     Document Type: Conference Paper

References (5)

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