Copper corrosion and anodic electrodissolution mechanisms in naturally aerated stagnant 0.5 M H2 SO4

Corrosion Science

Volumn 52, Issue 3, 2010, Pages 780-787

  Yonghong Lu, ^a   Wei Wang, ^a   Haibo Xu, ^a   Xiangfeng Kong, ^a   Jia Wang, ^a,b  

^a BEIJING UNIVERSITY OF POSTS AND TELECOMMUNICATIONS   (China)

^b INSTITUTE OF METAL RESEARCH   (China)

Author keywords

A. Copper; B. Electrochemical impedance spectroscopy (EIS); C. Chemical redox; C. Corrosion; C. Electrodissolution

Indexed keywords

B. ELECTROCHEMICAL IMPEDANCE SPECTROSCOPY (EIS); C. CHEMICAL REDOX; C. ELECTRODISSOLUTION; CATHODIC KINETICS; CORROSION POTENTIALS; DIFFUSION PROCESS; ELECTROCHEMICAL TECHNIQUES; ELECTRODISSOLUTION; HIGH POTENTIAL; OXYGEN MOLECULE; OXYGEN REDUCTION REACTION; THREE MODELS;

COPPER; COPPER CORROSION; CORROSION RATE; DISSOLUTION; DISSOLVED OXYGEN; ELECTROCHEMICAL CORROSION; ELECTROLYTIC REDUCTION; REACTION INTERMEDIATES;

ELECTROCHEMICAL IMPEDANCE SPECTROSCOPY;

EID: 74849130715     PISSN: 0010938X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.corsci.2009.10.037     Document Type: Article

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