Active/passive behavior of copper in strong sulfuric acid

Journal of the Electrochemical Society

Volumn 145, Issue 2, 1998, Pages 601-608

  Tromans, Desmond ^a,b   Ahmed, Tawfik ^a  

^a UNIVERSITY OF BRITISH COLUMBIA   (Canada)

^b ELECTROCHEMICAL SOCIETY   (Canada)

Author keywords

[No Author keywords available]

Indexed keywords

ANODIC POLARIZATION; CHLORINE COMPOUNDS; COMPOSITION EFFECTS; CONTAMINATION; COPPER COMPOUNDS; COPPER CORROSION; ELECTRIC CURRENTS; HYDRATION; PASSIVATION; SULFURIC ACID; THERMODYNAMICS;

COPPER SULFATE; LIMITING CURRENT BEHAVIOR; TAFEL SLOPE;

COPPER;

EID: 0031996543     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1838310     Document Type: Article

References (35)

1. A. K. Biswas and W. G. Davenport, Extractive Metallurgy of Copper, Pergamon Press, New York (1980).
2. S. Jin and E. Ghali, Can. Metall. Q., 32, 305 (1993).
3. X. Cheng and J. B. Hiskey, Metall. Mater. Trans. B, 27B, 393 (1996).
4. X. Cheng and J. B. Hiskey, ibid., 27B, 610 (1996).
5. S. Abe, B. W. Burrows, and V. A. Ettel, Can. Metall. Q., 19, 289 (1980).
6. T. T. Chen and J. E. Dutrizac, in The Electrorefining and Winning of Copper, J. E. Hoffman, R. G. Bautista, V. A. Ettel, V. Kudryk, and R. J. Wesely, Editors, pp 499-525, TMS-AIME, Warrendale, PA (1987).
7. T. T. Chen and J. E. Dutrizac, Metall. Mater. Trans. B, 20B, 345 (1989).
8. T. T. Chen and J. E. Dutrizac, in Hydrometallurgy and Electrometallurgy of Copper, W. C. Cooper, D. J. Kemp, G. E. Lagos, and K. G. Tan, Editors, pp 369-389, Pergamon Press, Inc., Elmsford, NY (1991).
9. D. Tromans and J. C. Silva, Corrosion, 53, 171 (1997).
10. H. P. Leckie, This Journal, 117, 1478 (1970).
11. Y. Awakura, T. Michimoto, Y. Takeshima, and H. Majima, Denki Kagaku, 51, 302 (1983).
12. T. Michimoto, Y. Awakura, and H. Majima, ibid., 51, 373 (1983)
13. Y. Awakura, K. Koyama, Y. Takegawa, and H. Majima, Metall. Trans. B, 21B, 689 (1990).
14. D. Tromans and R-h. Sun, This Journal, 138, 3235 (1991).
15. Handbook of Chemistry and Physics, 58th ed., R.C. Weast, Editor, pp B-111, B-144, D-262, and E-46, CRC Press, Inc., Boca Raton, FL (1978).
16. J. S. Newman, Electrochemical Systems, pp 127, 171-178, and 229-230, Prentice-Hall, Englewood Cliffs, NJ (1973).
17. C. F. Baes, J. Am. Chem. Soc., 79, 5611 (1957).
18. W. F. Linke and A. Seidel, Solubilities, Inorganic and Metal-Organic Compounds, Vol. I, 4th ed., pp 136, ACS, Washington, DC (1958).
19. H. S. Harned and B. B. Owen, The Physical Chemistry of Electrolytic Solutions, 3rd ed., pp 553, 561, and 563-565, Reinhold Publishing Corp., New York (1958).
20. W. M. Latimer, Oxidation Potentials, 2nd ed., pp 177-178, Prentice-Hall, Inc., Englewood Cliffs, NJ (1952).
21. Standard Potentials in Aqueous Solutions, A. J. Bard, R. Parsons, and J. Jordan, Editors, IUPAC, Marcel Dekker Inc., New York (1985).
22. J. O'M. Bockris and A. K. N. Reddy, Modern Electrochemistry, Vol. 2, Chap. 9 and 10, Plenum Press, New York (1970).
23. J. O'M. Bockris, Z. Nagy, and A. Damjanovic, This Journal, 119, 285 (1972).
24. E. Mattson and J. O'M. Bockris, Trans. Faraday Soc., 55, 1586 (1959).
25. W. H. Smyrl, in Comprehensive Treatment of Electrochemistry, Vol. 4, J. O'M. Bockris, B. E. Conway, E. Yeager, and R. E. White, Editors, pp 97-149, Plenum Press, New York (1981).
26. D. Tromans, B. Foster, and F. Weinberg, Corros. Sci., 39, 1291 (1997).
27. J. H. Schloen, in Hydrometallurgy and Electrometallurgy of Copper, W. C. Cooper, D. J. Kemp, G. E. Lagos, and K. G. Tan, Editors, pp 491-507, Pergamon Press, Inc., Elmsford, NY (1991).
28. F. R. McLarnon, R. H. Muller, and C. W. Tobias, Electrochim. Acta, 21, 101 (1976).
29. Powder Diffraction File, JCPDS - International Center for Diffraction Data, Swarthmore, PA (1991).
30. O. Kubaschewski and B. E. Hopkins, Oxidation of Metals and Alloys, 2nd ed., pp 22-29 and 182-194, Butterworth and Co., Ltd., London (1962).
31. D. Tromans and R-h. Sun, This Journal, 139, 1945 (1992).
32. C. D. Wagner, in Practical Surface Analysis, 2nd ed., D. Briggs and M. P. Seah, Editors, pp 595-634 and 639-642, John Wiley & Sons, Ltd., Chichester.
33. J. Lindberg, K. Hamrin, G. Johansson, U. Gelius, A. Fahlman, C. Nordling, and K. Siegbahn, Phys. Scr., 1, 286 (1970).
34. S. Jin and E. Ghali, Can. Metall. Q., 31, 259 (1992).
35. L. E. Orgel, An Introduction to Transition-Metal Chemistry Ligand Field Theory, pp 14 and 46, Methuen and Co., Ltd., London (1960).