Improvement on the high temperature thermoelectric performance of Ga-doped misfit-layered Ca3Co4-xGaxO9+δ (x = 0, 0.05, 0.1, and 0.2)

Journal of Alloys and Compounds

Volumn 491, Issue 1-2, 2010, Pages 53-56

  Nong, N V ^a   Liu, Chia Jyi ^a   Ohtaki, M ^b  

^a NATIONAL CHANGHUA UNIVERSITY OF EDUCATION   (Taiwan)

^b KYUSHU UNIVERSITY   (Japan)

Author keywords

Figure of merit; Hot press; Misfit cobalt oxides; Thermoelectricity

Indexed keywords

COBALT OXIDES; ELECTRICAL CONDUCTIVITY; FIGURE OF MERIT; GA-DOPED; HIGH TEMPERATURE; HOT PRESS; MISFIT COBALT OXIDES; NON-DOPED; ROOM TEMPERATURE; SOLID STATE REACTION METHOD; THERMOELECTRIC OXIDES; THERMOELECTRIC PERFORMANCE; THERMOELECTRIC PROPERTIES; THERMOPOWERS;

CALCIUM; COBALT; ELECTRIC CONDUCTIVITY; HOT PRESSING; OXIDES; PRESSES (MACHINE TOOLS); SOLID STATE REACTIONS; THERMOELECTRICITY;

GALLIUM;

EID: 74449083882     PISSN: 09258388     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jallcom.2009.11.009     Document Type: Article

References (22)

1. Shikano M., and Funahashi R. Appl. Phys. Lett. 82 (2003) 1851
2. Masset A.C., Michel C., Maignan A., Hervieu M., Toulemende O., Studer S., and Raveau B. Phys. Rev. B 62 (2000) 166
3. Miyazaki Y., Kudo K., Akoshima M., Ono Y., Koike Y., and Kajitani T. Jpn. J. Appl. Phys. 39 (2000) L531
4. Funahaski R., Matsubara I., Ikuta H., Takechi T., Mizutani U., and Sodeoka S. Jpn. J. Appl. Phys. Part 2 39 (2000) L1127
5. Li S., Funahashi R., Malsubara I., Ueno K., Sodeoka S., and Yamada H. J. Mater. Sci. Lett. 19 (2000) 1339
6. Masuda Y., Nagahama D., Itahara H., Tani T., Seo W.S., and Koumoto K. J. Mater. Chem. 13 (2003) 1094
7. Matsubara I., Funahashi R., Takeuchi T., and Sodeoka S. J. Appl. Phys. 90 (2001) 462
8. Zhou Y., Matsubara I., Horii S., Takeuchi T., Funahashi R., Shikano M., Shimoyama J.-I., Kishio K., Shin W., Izu N., and Murayama N. J. Appl. Phys. 93 5 (2003) 2653
9. Nan J., Wu J., Deng Y., and Nan C.W. J. Eur. Ceram. Soc. 23 (2003) 859
10. Wang D., Cheng L., Yao Q., and Li J. Solid State Comm. 129 (2004) 615
11. Liu Y., Lin Y., Shi Z., and Nan C.-W. J. Am. Ceram. Soc. 88 5 (2005) 1337
12. Liu C.-J., Huang L.-C., and Wang J.-S. Appl. Phys. Lett. 89 (2006) 204102
13. Liu Y., Lin Y., Jiang L., Nan C.-W., and Shen Z. J. Electroceram. (2007) 10.1007/s10832-007-9297-x
14. Wang Y., Sui Y., Cheng J., Wang X., Miao J., Liu Z., Qian Z., and Su W. J. Alloys Compd. 448 (2008) 1
15. Liu C.-J., Chen J.-L., Huang L.-C., Lin Z.-R., and Chang C.-L. J. Appl. Phys. 102 (2007) 014908
16. Limelette P., Hardy V., Auban-Senzier P., Jérome D., Flahaut D., Hébert S., Frésard R., Simon Ch., Noudem J., and Maignan A. Phys. Rev. B 71 (2005) 233108
17. Mott N.F., and Davis E.A. Electronic Process in Non-Crystalline Materials. 2nd edition (1979), Clarendon, Oxford pp. 52
18. Liu C.-J., Wu T.-W., Downes J., and Staines M.P. Physica C 390 (2003) 374
19. Liu C.-J., Liao J.-Y., Wu T.-W., and Jen B.-Y. J. Mater. Sci. 39 (2004) 4569
20. Liu C.-J., Nayak P.K., Lin Z.-R., and Jeng K.-Y. Thin Solid Films 516 (2008) 8564
21. Seo J., Park K., Lee D., and Lee C. Scripta Mater. 38 (1998) 477
22. Asahi R., Sugiyama J., and Tani T. Phys. Rev. 66 (2002) 155103