Voltammetry and electrodeposition in the presence of attractive interactions: I. A mean-field approach

Journal of Electroanalytical Chemistry

Volumn 573, Issue 2, 2004, Pages 365-376

  Berthier, F ^a   Braems, I ^a   Creuze, J ^a   Tetot R ^a   Legrand, B ^b  

^a UNIVERSITÉ PARIS SACLAY   (France)

^b CEA SACLAY   (France)

Author keywords

Electrodeposition; Frumkin isotherm; Langmuir isotherm; Voltammetry

Indexed keywords

ADSORPTION ISOTHERMS; APPROXIMATION THEORY; COMPUTER SIMULATION; CURRENT DENSITY; ELECTRIC IMPEDANCE; ELECTRODES; FILM GROWTH; MONTE CARLO METHODS;

FRUMKIN ISOTHERM; LANGMUIR ISOTHERM; SWEEP RATES; VOLTAMMETRY;

ELECTRODEPOSITION;

EID: 7444254123     PISSN: 15726657     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jelechem.2004.07.024     Document Type: Article

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