Atomistic investigation of the Kolmogorov-Johnson-Mehl-Avrami law in electrodeposition process

Journal of Electroanalytical Chemistry

Volumn 561, Issue SUPPL. 1, 2004, Pages 37-52

  Berthier, F ^a   Legrand, B ^b   Creuze, J ^c   Tetot R ^a  

^a UNIVERSITÉ PARIS SUD   (France)

^b CEA SACLAY   (France)

^c UNIVERSITÉ PARIS SACLAY   (France)

Author keywords

Classical nucleation theory; Cu Ag; Electrodeposition; Monte Carlo simulations; Tight binding Ising model

Indexed keywords

ALGORITHMS; COMPUTER SIMULATION; MONTE CARLO METHODS; NUCLEATION; PARAMETER ESTIMATION; PHASE TRANSITIONS; SILVER; SINGLE CRYSTALS; ADSORPTION; COPPER; ELECTROCHEMICAL ELECTRODES; HAMILTONIANS; ISOTHERMS; KINETIC THEORY;

CLASSICAL NUCLEATION THEORY; CU-AG; GROWTH PROCESSES; TIGHT-BINDING ISING MODEL; INTERATOMIC POTENTIALS; TIGHT-BINDING ISING MODELS;

ELECTRODEPOSITION;

EID: 0344493980     PISSN: 00220728     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jelechem.2003.07.018     Document Type: Article

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