Effect of annealing on the electrical, optical and structural properties of cadmium stannate thin films prepared by spray pyrolysis technique

Thin Solid Films

Volumn 518, Issue 8, 2010, Pages 2271-2274

  Kumaravel, R ^a   Krishnakumar, V ^b   Gokulakrishnan, V ^a   Ramamurthi, K ^a   Jeganathan, K ^a  

^a BHARATHIDASAN UNIVERSITY   (India)

^b DARMSTADT UNIVERSITY OF TECHNOLOGY   (Germany)

Author keywords

Cadmium stannate; Conductivity; Optical properties; Semiconductors; Spray pyrolysis; X ray diffraction

Indexed keywords

ANNEALED FILMS; ANNEALING IN VACUUM; AVERAGE GRAIN SIZE; CADMIUM STANNATE; CONDUCTIVITY; ELECTRICAL , OPTICAL AND STRUCTURAL PROPERTIES; ELECTRICAL AND OPTICAL PROPERTIES; IN-VACUUM; OPTICAL TRANSMITTANCE; POLYCRYSTALLINE THIN FILM; POST DEPOSITION ANNEALING; SPRAY PYROLYSIS METHOD; SPRAY-PYROLYSIS TECHNIQUES; SUBSTRATE TEMPERATURE; VISIBLE REGION;

ANNEALING; CADMIUM; DIFFRACTION; ELECTRIC PROPERTIES; FILM PREPARATION; OPTICAL PROPERTIES; SUBSTRATES; THERMOGRAVIMETRIC ANALYSIS; THIN FILMS; VACUUM; X RAY DIFFRACTION;

SPRAY PYROLYSIS;

EID: 73949142406     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2009.08.049     Document Type: Article

References (34)

1. Vaezi M.R., and Sadrnezhaad S.K. Mater. Sci. Eng. B 141 (2007) 23
2. Kammalar D.R., Mason T.O., and Poeppelmeier K.R. Chem. Mater. 12 (2000) 1954
3. Coutts T.J., Young D.L., Li X., Mulligan W.P., and Wu X. J. Vac. Sci. Technol. A 18 (2000) 2646
4. Enoki H., Nakayama T., and Echigoya J. Phys. Status Solidi A 129 (1992) 181
5. Yanagawa K., Ohki Y., Ueda N., Omata T., Hashimoto T., and Kawazoe H. Appl. Phys. Lett. 63 (1993) 3355
6. Ueda N., Omata T., Hikuma N., Ueda K., Mizoguchi H., Hashimoto T., and Kawazoe H. Appl. Phys. Lett. 61 (1992) 1954
7. Pisarkiewicz T., Zakrzewska K., and Leja E. Thin Solid Films 153 (1983) 479
8. Mamazza Jr. R., Morel D.L., and Ferekides C.S. Thin Solid Films 484 (2005) 26
9. Wohlmuth W., and Adesida I. Thin Solid Films 479 (2005) 223
10. Wu X., Mulligan W.P., and Coutts T.J. Thin Solid Films 286 (1996) 274
11. Li X., Gessert T.A., and Coutts T. Appl. Surf. Sci. 223 (2004) 138
12. Miyata N., Miyake K., and Yamaguchi Y. Appl. Phys. Lett. 37 (1980) 180
13. Leja E., Budzynska K., Pisarkiewicz T., and Stapinski T. Thin Solid Films 100 (1983) 203
14. Bel Hadj Tahar R., Ban T., Ohya Y., and Takahashi Y. J. Am. Ceram. Soc. 84 (2001) 85
15. Agnihotri O.P., Gupta B.K., and Sharma A.K. J. Appl. Phys. 49 (1978) 4540
16. Abrutis A., Valincius G., Baltrunas G., Parafionovic L., Valiuniene A., and Saltyte Z. Thin Solid Films 515 (2007) 6817
17. Krishnakumar V., Ramamurthi K., Kumaravel R., and Santhakumar K. Curr. Appl. Phys. 9 (2008) 467
18. Haacke G., Ando H., and Mealmaker W.E. J. Electrochem. Soc. 124 (1977) 1923
19. Elangovan E., and Ramamurthi K. J. Optoelectron. Adv. Mater. 5 (2003) 45
20. JCPDS - International Centre for Diffraction Data, Card No. 34-0928, 1997.
21. Cullity B.D. Elements of X-ray Diffraction (1956), Addison-Wesley, Massachusetts
22. Raviendra D., and Sharma J.K. J. Appl. Phys. 58 (1985) 838
23. Cardile C.M., Bowden M.E., Koplick A.J., and Buckley R.G. Thin Solid Films 186 (1990) L11
24. Nozik A.Z. Phys. Rev. B. 6 (1972) 453
25. Haacke G. Appl. Phys. Lett. 28 (1976) 622
26. Miyata N., and Miyake K. Jpn.J. Appl. Phys. 17 (1978) 1673
27. Myata N., Miyake K., Fukushima T., and Koga K. Appl. Phys. Lett. 35 (1979) 542
28. Ortiz A. J. Vac. Sci. Technol. 20 (1982) 7 R
29. Zhu M., Huang H., Gong J., Sun C., and Jiang X. J. Appl. Phys. 102 (2007) 043106
30. Lloyd P. Thin Solid Films 41 (1977) 113
31. Wu X., Coutts T.J., and Mulligan W.P. J. Vac. Sci. Technol. A 15 (1997) 1057
32. Schiller S., Beister G., Buedke E., Becker H.J., and Schicht H. Thin Solid Films 96 (1982) 113
33. Stapinski T., Leja E., and Pisarkiewicz T. J. Phys. D: Appl. Phys. 17 (1984) 407
34. Haacke G. J. Appl. Phys. 47 (1976) 4086