Maskless optical microscope lithography system

Review of Scientific Instruments

Volumn 80, Issue 12, 2009, Pages

  Park, Eung Seok ^a   Jang, Doyoung ^a   Lee, Jaewoo ^a   Kim, Yun Jeong ^a   Na, Junhong ^a   Ji, Hyunjin ^a   Choi, Jae Wan ^a   Kim, Gyu Tae ^a  

^a Korea University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

COATED SUBSTRATES; FOCUSED BEAMS; LITHOGRAPHY SYSTEMS; MASK LESS; MICRO-SCALES; MICROSCALE PATTERNS; MOTORIZED STAGE; OPTICAL MICROSCOPES; PATTERN DESIGNS; SINGLE NANOWIRES; TEST PATTERN;

MICROSCOPES;

EID: 73849139998     PISSN: 00346748     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3266965     Document Type: Article

References (6)

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