Capacitive manganese-cobalt oxide thin films by radio-frequency sputtering

Journal of the Electrochemical Society

Volumn 157, Issue 2, 2010, Pages

  Lin, Chuen Chang ^a   Lee, Chih Chung ^a  

^a NATIONAL YUNLIN UNIVERSITY OF SCIENCE AND TECHNOLOGY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING TEMPERATURES; CHARGE-DISCHARGE CYCLE; GRAPHITE FOILS; MANGANESE-COBALT OXIDES; OPERATIONAL STABILITY; OPTIMUM CONDITIONS; POTENTIAL CYCLING; RADIO FREQUENCY SPUTTERING; SPECIFIC CAPACITANCE; SPUTTERING POWER; SPUTTERING PRESSURES; SWEEP RATES; VOLUME FLOW RATE;

ANNEALING; CAPACITANCE; COBALT; ELECTRIC DISCHARGES; MANGANESE; OXIDE FILMS; OXYGEN; THIN FILMS;

MANGANESE OXIDE;

EID: 73849130239     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.3271105     Document Type: Article

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