Wave and particle in molecular interference lithography

Physical Review Letters

Volumn 103, Issue 26, 2009, Pages

  Juffmann, Thomas ^a   Truppe, Stefan ^a   Geyer, Philipp ^a   Major, András G ^d   Deachapunya, Sarayut ^a,b   Ulbricht, Hendrik ^a,c   Arndt, Markus ^a  

^a UNIVERSITY OF VIENNA   (Austria)

^b BURAPHA UNIVERSITY   (Thailand)

^c UNIVERSITY OF SOUTHAMPTON   (United Kingdom)

^d CARL ZEISS SMT AG   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ATOM INTERFEROMETRY; COMPLEX MOLECULES; DETECTION SCHEME; MATTER-WAVE INTERFERENCE; MODERN TOOLS; MOLECULAR INTERFERENCE; NEW APPROACHES; QUANTUM INTERFERENCE; QUANTUM PHYSICS; QUANTUM WAVES; SI (1 1 1); WAVE-PARTICLE DUALITY;

PHOTOLITHOGRAPHY; SCANNING TUNNELING MICROSCOPY;

QUANTUM INTERFERENCE DEVICES;

EID: 73649134371     PISSN: 00319007     EISSN: 10797114     Source Type: Journal    
DOI: 10.1103/PhysRevLett.103.263601     Document Type: Article

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