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Journal of Applied Electrochemistry

Volumn 40, Issue 1, 2010, Pages 133-141

Fabrication of manganese oxide electrodes by radio frequency sputtering for electrochemical capacitors

(2) Lin, Chuen Chang a Lee, Chih Chung a

a NATIONAL YUNLIN UNIVERSITY OF SCIENCE AND TECHNOLOGY (Taiwan)

Author keywords

Annealing; Electrochemical capacitors; Manganese oxide; Sputtering; Surface roughness

Indexed keywords

AS ANNEALING; ELECTROCHEMICAL CAPACITOR; ELECTROCHEMICAL STABILITIES; GRAPHITE FOILS; MANGANESE OXIDE ELECTRODES; POTENTIAL CYCLING; RADIO-FREQUENCY SPUTTERING; SPECIFIC CAPACITANCE; SPUTTERING CONDITIONS; SPUTTERING PRESSURES; SWEEP RATES; VOLUME FLOW RATE;

ANNEALING; CAPACITANCE; CAPACITORS; ELECTRODES; ELECTROLYTIC CAPACITORS; MANGANESE; METAL ANALYSIS; OXIDE FILMS; OXIDES; OXYGEN; RADIO; RADIO WAVES; SURFACE PROPERTIES; SURFACE ROUGHNESS;

MANGANESE OXIDE;

EID: 73349092726 PISSN: 0021891X EISSN: None Source Type: Journal
DOI: 10.1007/s10800-009-9989-9 Document Type: Article

Times cited : (7)

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