Two-dimensional photonic crystals fabricated in monolithic single-crystal silicon

IEEE Photonics Technology Letters

Volumn 22, Issue 2, 2010, Pages 67-69

  Hadzialic, Sanja ^a,b   Kim, Sora ^c   Sudbø, Aasmund Svei'nung ^b   Solgaard, Olav ^d  

^a UNIVERSITY OF OSLO   (Norway)

^b UNIVERSITY OF OSLO   (Norway)

^c GE GLOBAL RESEARCH   (United States)

^d Stanford University   (United States)

Author keywords

Broadband mirror; Monolithic photonic crystals (PCs); Photonic crystal (PC) devices; Photonic crystal (PC) fabrication

Indexed keywords

1550 NM; BROADBAND MIRROR; BROADBAND MIRRORS; COMPLEMENTARY METAL OXIDE SEMICONDUCTORS; FABRICATION OF PHOTONIC CRYSTALS; FLAT MEMBRANE; HIGH REFLECTIVITY; INTERNAL STRESS; LITHOGRAPHIC MASK; MICRO ELECTRO MECHANICAL SYSTEM; MONOLITHIC PHOTONIC CRYSTALS (PCS); MONOLITHIC STRUCTURES; PHOTONIC CRYSTAL DEVICES; SENSOR APPLICATIONS; SILICON-ON-INSULATOR MATERIALS; SINGLE CRYSTAL SILICON; SINGLE-CRYSTAL SI; TELECOMMUNICATION WAVELENGTHS; TEMPERATURE EXPANSION; TWO-DIMENSIONAL PHOTONIC CRYSTALS; WAVELENGTH REGIONS;

FABRICATION; MEMBRANE STRUCTURES; MEMS; MICROCOMPUTERS; MICROELECTROMECHANICAL DEVICES; MIRRORS; PHOTONIC DEVICES; PHOTONICS; REFLECTION; SEMICONDUCTING SILICON COMPOUNDS; SILICON ON INSULATOR TECHNOLOGY; SILICON WAFERS; TELECOMMUNICATION SYSTEMS;

PHOTONIC CRYSTALS;

EID: 73249152994     PISSN: 10411135     EISSN: None     Source Type: Journal    
DOI: 10.1109/LPT.2009.2036143     Document Type: Article

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