Transient processes at the deposition of charged Langmuir monolayers

Colloids and Surfaces A: Physicochemical and Engineering Aspects

Volumn 354, Issue 1-3, 2010, Pages 226-233

  Bondarenko, M P ^a   Kovalchuk, V I ^a   Zholkovskiy, E K ^a   Vollhardt, D ^b  

^a INSTITUTE OF BIOCOLLOID CHEMISTRY   (Ukraine)

^b MAX PLANCK INSTITUTE OF COLLOIDS AND INTERFACES   (Germany)

Author keywords

Charged Langmuir monolayers; Concentration polarization; Electrokinetic mechanism; Langmuir Blodgett films; Meniscus relaxation; Pattern formation; Three phase contact; Transient processes

Indexed keywords

DRUG PRODUCTS; ELECTRIC POTENTIAL; ELECTRODYNAMICS; ELECTRON ENERGY LEVELS; MAGNETIC BUBBLES; MATHEMATICAL MODELS; MONOLAYERS; POLARIZATION; TRANSMISSION LINE THEORY;

CONCENTRATION POLARIZATION; ELECTROKINETIC; ELECTROKINETIC MECHANISM; LANGMUIR MONOLAYERS; PATTERN FORMATION; THREE-PHASE CONTACT; TRANSIENT PROCESS;

LANGMUIR BLODGETT FILMS;

ION;

ARTICLE; CHEMICAL REACTION KINETICS; CONCENTRATION (PARAMETERS); ELECTRIC POTENTIAL; EQUILIBRIUM CONSTANT; ION CURRENT; LANGMUIR BLODGETT FILM; PREDICTION; PRIORITY JOURNAL; PROCESS DEVELOPMENT;

EID: 73049107517     PISSN: 09277757     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.colsurfa.2009.09.023     Document Type: Article

References (27)

1. Xia Y., Qin D., and Yin Y. Curr. Opin. Colloid Interface Sci. 6 (2001) 54-64
2. Yabu H., and Shimomura M. Adv. Funct. Mater. 15 (2005) 575-581
3. Badia A., Moraille P., Tang N.Y.W., and Randlett M.E. Int. J. Nanotechnol. 5 (2008) 1371-1395
4. Tao A.R., Huang J., and Yang A.P. Acc. Chem. Res. 41 (2008) 1662-1673
5. Spratte K., Chi L.F., and Riegler H. Europhys. Lett. 25 (1994) 211
6. Gleiche M., Chi L.F., and Fuchs H. Nature 403 (2000) 173
7. Chen X.D., Lu N., Zhang H., Hirtz M., Wu L.X., Fuchs H., and Chi L.F. J. Phys. Chem. B 110 (2006) 8039-8046
8. Moraille P., and Badia A. Langmuir 19 (2003) 8041-8049
9. Mahnke J., Vollhardt D., Stöckelhuber K.W., Meine K., and Schulze H.J. Langmuir 15 (1999) 8220-8224
10. Kovalchuk V.I., Bondarenko M.P., Zholkovskiy E.K., and Vollhardt D. J. Phys. Chem. B 107 (2003) 3486-3495
11. Hasmonay H., Vincent M., and Dupeyrat M. Thin Solid Films 68 (1980) 21
12. Bloch J.M., and Yun W. Phys. Rev. A 41 (1990) 844
13. Ahn D.J., and Franses E.I. AIChE J. 40 (1994) 1046
14. Kovalchuk V.I., Zholkovskiy E.K., Bondarenko M.P., and Vollhardt D. J. Phys. Chem. B 105 (2001) 9254
15. Díaz M.E., Cerro R.L., Montes F.J., and Gálan M.A. Chem. Eng. J. 131 (2007) 155
16. Bondarenko M.P., Zholkovskiy E.K., Kovalchuk V.I., and Vollhardt D. J. Phys. Chem. B 110 (2006) 1843
17. Bondarenko M.P., Kovalchuk V.I., Zholkovskiy E.K., and Vollhardt D. J. Phys. Chem. B 111 (2007) 1684
18. Kovalchuk V.I., Bondarenko M.P., Zholkovskiy E.K., and Vollhardt D. J. Phys. Chem. B 112 (2008) 11333-11340
19. Gaines Jr. G.L. J. Colloid Interface Sci. 59 (1977) 438
20. Peng J.B., He S., Dutta P., and Ketterson J.B. Thin Solid Films 202 (1991) 351-357
21. Petrov J.G., and Angelova A. Langmuir 8 (1992) 3109
22. Petrov J.G., Angelova A., and Mobius D. Langmuir 8 (1992) 206-212
23. Aveyard R., Binks B.P., Fletcher P.D.I., and Ye X. Colloids Surf. A 94 (1995) 279
24. Petrov J.G., Kuhn H., and Möbius D. J. Colloid Interface Sci. 73 (1980) 66
25. de Gennes P.G. Colloid Polym. Sci. 264 (1986) 463
26. Kovalchuk V.I., Zholkovskiy E.K., Bondarenko M.P., and Vollhardt D. J. Adhes. 80 (2004) 851
27. Maxwell J.C. A Treatise of Electricity and Magnetism. second ed. 1 (1881), Clarendon Press, Oxford p. 435