Preparation and field electron emission of diamond films on porous silicon substrates with MW-CVD technique

Pan Tao Ti Hsueh Pao/Chinese Journal of Semiconductors

Volumn 25, Issue 3, 2004, Pages 288-291

  Chen, Guanghua ^a,b   Cai, Rangqi ^b   Song, Xuemei ^a   He, Deyan ^b  

^a BEIJING UNIVERSITY OF TECHNOLOGY   (China)

^b LANZHOU UNIVERSITY   (China)

Author keywords

Diamond film; Field electron emission; Porous silicon

Indexed keywords

CHEMICAL VAPOR DEPOSITION; ELECTRON EMISSION; MICROWAVES; NANOSTRUCTURED MATERIALS; POROUS SILICON;

DIAMOND PROTUBERANCE ARRAY; FIELD ELECTRON EMISSION;

DIAMOND FILMS;

EID: 7244251745     PISSN: 02534177     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (8)

1. Chen Guanghua, Shao Lexi, He Deyan, et al. The background, current status and questions concerning electron field emission from wide band-gap films. Physics, 2000, 29(5): 278
2. Zhang Shengjun, Chen Guanghua, Gong Weibin, et al. Field electron emission of nano-diamond films. Metal Foundational Materials, 2001, 8(suppl.): 196
3. Chen Guanghua, Deng Jinxiang. New electron film materials. Beijing: Chemical Industry Press, 2002 : 210
4. Shao Lexi. Preparation of wide band-gap materials and their electron field emission. PhD Thesis of Lanzhou University, 1999
5. Cai Rangqi, Chen Guanghua, Song Xuemei, et al. Field electron emission of diamond films on nanocrystalline diamond coating by CVD method. Chinese Science Bulletin, 2003, 48(12): 1282
6. Cai Rangqi. Investigation of microwave plasma CVD nanocrystalline diamond field electron emission. PhD Thesis of Lanzhou University, 2002
7. Shao Lexi, Xie Erqing, Chen Guanghua, et al. Field electron emission of N-doped diamond film by growth-doping and ion implantation. Chinese Journal of Semiconductors, 1999, 20: 780 (in Chinese)
8. Baranauskas V, Tosin M C, Peterlevitz A C, et al. Microcrystalline diamond deposition on a porous silicon host matrix. Mater Sci Eng B, 2000, 69/70: 171