Ion implanted integrated optics (I3O) technology for planar lightwave circuits fabrication

Journal of Lightwave Technology

Volumn 22, Issue 10, 2004, Pages 2310-2315

  Drouard, Emmanuel ^a   Escoubas, Ludovic ^b   Flory, François ^b   Tisserand, Stéphane ^c   Roux, Laurent ^c  

^a ECOLE CENTRALE DE LYON   (France)

^b CNRS   (France)

^c SILIOS Technologies   (France)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; ELECTROMAGNETIC FIELDS; INTEGRATED CIRCUITS; ION IMPLANTATION; IONS; OPTICAL PROPERTIES; OPTICAL WAVEGUIDES; REFRACTIVE INDEX; SILICA; SINGLE MODE FIBERS;

BENT WAVEGUIDE; CHANNEL WAVEGUIDE; ION IMPLANTED INTEGRATED OPTICS; PASSIVE INTEGRATED CIRCUITS; PLANAR LIGHTWAVE CIRCUITS;

INTEGRATED OPTICS;

EID: 7244243722     PISSN: 07338724     EISSN: None     Source Type: Journal    
DOI: 10.1109/JLT.2004.833285     Document Type: Article

References (10)

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