Investigation into tolerance of polysiloxane-block-polyimide film against atomic oxygen

Acta Astronautica

Volumn 66, Issue 5-6, 2010, Pages 922-928

  Miyazaki, Eiji ^a   Tagawa, Masahito ^b   Yokota, Kumiko ^b   Yokota, Rikio ^c   Kimoto, Yugo ^a   Ishizawa, Junichiro ^a  

^a Aerospace Research and Development Directorate   (Japan)

^b KOBE UNIVERSITY   (Japan)

^c JAPAN AEROSPACE EXPLORATION AGENCY   (Japan)

Author keywords

Atomic oxygen; Low earth orbit; Polyimide film; Self healing; Self organize; Silicon containing

Indexed keywords

ATOMIC OXYGEN; LOW EARTH ORBITS; POLYIMIDE FILM; SELF-HEALING; SELF-ORGANIZE;

ARCTIC ENGINEERING; ATOMS; COMMUNICATION SATELLITES; IRRADIATION; ORBITS; OXYGEN; SILICON OXIDES; SILICONES; SPECTROSCOPIC ANALYSIS; TEST FACILITIES; X RAY PHOTOELECTRON SPECTROSCOPY;

POLYIMIDES;

EID: 72149095135     PISSN: 00945765     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.actaastro.2009.09.002     Document Type: Article

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