Numerical simulation of NO oxidation in dielectric barrier discharge with microdischarge formation

Japanese Journal of Applied Physics

Volumn 48, Issue 7 PART 1, 2009, Pages

  Tochikubo, Fumiyoshi ^a   Uchida, Satoshi ^a   Yasui, Hiroyuki ^b   Sato, Kazuo ^b  

^a TOKYO METROPOLITAN UNIVERSITY   (Japan)

^b TOSHIBA CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL PROCESS; DIELECTRIC BARRIER DISCHARGES; DISCHARGE CONDITIONS; FLUID MODELS; GAS DISCHARGE; GAS RESIDENCE; GAS TEMPERATURE; MICRODISCHARGES; NO OXIDATION; NUMERICAL SIMULATION; PARALLEL PLATE GEOMETRY; RADICAL PRODUCTION; RATE EQUATIONS; SIMULATION MODEL;

ATMOSPHERIC PRESSURE; CHEMICAL ENGINEERING; DIELECTRIC DEVICES; FLOW CONTROL; GLOW DISCHARGES; OXIDATION; PLASMAS; THERMAL EFFECTS;

SIMULATORS;

EID: 72149083347     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.48.076507     Document Type: Article

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