Pulsed corona and dielectric-barrier discharge processing of NO in N2

Applied Physics Letters

Volumn 68, Issue 26, 1996, Pages 3719-3721

  Penetrante, B M ^a   Hsiao, M C ^a   Merritt, B T ^a   Vogtlin, G E ^a   Wallman, P H ^a   Neiger, M ^b   Wolf, O ^b   Hammer, T ^c   Broer, S ^c  

^a LAWRENCE LIVERMORE NATIONAL LABORATORY   (United States)

^b UNIVERSITY OF KARLSRUHE   (Germany)

^c SIEMENS AG   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0347789346     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.115984     Document Type: Article

References (11)

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