SCOPUS 정보 검색 플랫폼

Japanese Journal of Applied Physics

Volumn 48, Issue 7 PART 1, 2009, Pages

Degradation mechanism of secondary electron emission in plasma-exposed MgO films

(6) Yu, Hak Ki a Kim, Woong Kwon a Lee, Jong Lam a Park, Eung Chul b Kim, Jae Sung b Ryu, Jae Hwa b

a Pohang University of Science and Technology (POSTECH) (South Korea)

b LG Electronics Inc (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

AR PLASMAS; DEGRADATION MECHANISM; MGO FILMS; PREFERENTIAL SPUTTERING; SECONDARY ELECTRON EMISSIONS; SYNCHROTRON RADIATION PHOTOEMISSION SPECTROSCOPY;

DEGRADATION; EMISSION SPECTROSCOPY; HELIUM; IONS; NEON; SECONDARY EMISSION; SYNCHROTRON RADIATION;

PLASMAS;

EID: 72049119085 PISSN: 00214922 EISSN: 13474065 Source Type: Journal
DOI: 10.1143/JJAP.48.076003 Document Type: Article

Times cited : (6)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.