Energetic deposition of carbon clusters with preferred orientation using a new mixed mode cathodic arc - Sputtering process

Carbon

Volumn 48, Issue 3, 2010, Pages 918-921

  Lattemann, M ^a,b   Moafi, A ^c   Bilek, M M M ^a   McCulloch, D G ^c   McKenzie, D R ^a  

^a UNIVERSITY OF SYDNEY   (Australia)

^b KARLSRUHE INSTITUTE OF TECHNOLOGY   (Germany)

^c RMIT UNIVERSITY   (Australia)

Author keywords

[No Author keywords available]

Indexed keywords

CATHODIC ARC; FILM SURFACES; GROWTH SURFACES; HIGH VOLTAGE PULSE; IN-PLANE; MACRO-PARTICLES; MIXED MODE; NEGATIVE SUBSTRATES; PREFERRED ORIENTATIONS; SPUTTERING PROCESS;

CARBON CLUSTERS; ELECTRIC POTENTIAL; GLOW DISCHARGES; MAGNETRONS;

CARBON FILMS;

EID: 71949126483     PISSN: 00086223     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.carbon.2009.10.029     Document Type: Letter

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