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Volumn 609, Issue 2-3, 2009, Pages 294-299
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The Columbia University sub-micron charged particle beam
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Author keywords
Charged particle beam; Electrostatic; Microbeam; Quadrupole; Sub micron
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Indexed keywords
BEAM SPOT;
COLUMBIA UNIVERSITY;
ELECTROSTATIC QUADRUPOLE;
LENS DESIGNS;
LENS SYSTEMS;
MICRO BEAMS;
QUADRUPOLES;
RELATIVE STRENGTH;
SUBMICRON;
VOLTAGE STABILITY;
WITHSTAND VOLTAGE;
CHARGED PARTICLES;
ELECTRODES;
ELECTROSTATICS;
HELIUM;
ION BOMBARDMENT;
ION IMPLANTATION;
LENSES;
OPTICAL INSTRUMENTS;
PARTICLE BEAM DYNAMICS;
PARTICLE BEAMS;
ELECTROSTATIC LENSES;
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EID: 71749120408
PISSN: 01689002
EISSN: None
Source Type: Journal
DOI: 10.1016/j.nima.2009.08.041 Document Type: Article |
Times cited : (34)
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References (16)
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