Design and demonstration of PECVD multilayer dielectric mirrors optimized for micromachined cavity angled sidewalls

Sensors and Actuators, A: Physical

Volumn 155, Issue 1, 2009, Pages 23-32

  Perez, Maximillian A ^a   Kitching, John ^b   Shkel, Andrei M ^a  

^a UNIVERSITY OF CALIFORNIA   (United States)

^b NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

Author keywords

Atomic MEMS; Bragg reflector; Optical MEMS; PECVD; Thin films; Vapor cells

Indexed keywords

ABSORPTION WAVELENGTHS; ATOMIC MEMS; ATOMIC VAPOR CELL; DESIGN WAVELENGTH; DIELECTRIC THIN FILMS; HIGH EFFICIENCY; MICROMACHINED; MULTILAYER DIELECTRICS; OPTICAL MEMS; OPTIMIZED DESIGNS; QUARTER WAVES; REFLECTIVE BANDWIDTH; REFLECTOR DESIGN; REFLECTOR SURFACES; REFLECTOR TECHNOLOGY; RETURN LOSS; VAPOR CELLS;

ATOMS; BRAGG REFLECTORS; DEPOSITION; DESIGN; FILM PREPARATION; MAGNETIC FILMS; MEMS; MICROELECTROMECHANICAL DEVICES; PLASMA DEPOSITION; POLARIZATION; REFLECTION; RUBIDIUM; THIN FILMS; VAPORS;

PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;

EID: 71749117786     PISSN: 09244247     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.sna.2008.10.007     Document Type: Article

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