Comparison of different electrochemical deposits for contact metallization of silicon solar cells

Materials Science and Engineering: B

Volumn 165, Issue 1-2, 2009, Pages 53-56

  Boulord, C ^a   Kaminski, A ^a   Veschetti, Y ^b   Lemiti, M ^a  

^a INSTITUT DES NANOTECHNOLOGIES DE LYON   (France)

^b CEA GRENOBLE   (France)

Author keywords

Electroless plating; Metallization; Nickel phosphorous; Solar cells

Indexed keywords

ELECTROLESS PLATING; METALLIZING; NICKEL; NICKEL COMPOUNDS; NICKEL DEPOSITS; PHOSPHORUS; SCANNING ELECTRON MICROSCOPY; SILICON SOLAR CELLS;

CELL CONTACTS; CONTACT DEPOSITION; CONTACT METALLIZATION; ELECTROCHEMICALS; ELECTROLESS NICKEL-PHOSPHOROUS; METALLISATION; N TYPE SILICON; SCREEN-PRINTED; SEED LAYER; SILICON SAMPLES;

DEPOSITS;

EID: 71749096666     PISSN: 09215107     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mseb.2008.10.039     Document Type: Article

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