Development of an on-line isotope dilution laser ablation inductively coupled plasma mass spectrometry (LA-ICP-MS) method for determination of boron in silicon wafers

Talanta

Volumn 80, Issue 3, 2010, Pages 1222-1227

  Yang, Chao Kai ^a,b   Chi, Po Hsiang ^a   Lin, Yong Chine ^a   Sun, Yuh Chang ^a   Yang, Mo Hsiung ^a  

^a NATIONAL TSING HUA UNIVERSITY   (Taiwan)

^b Taipei City Police Department   (Taiwan)

Author keywords

LA ICP MS; On line isotope dilution; Silicon wafer

Indexed keywords

ABLATION; AEROSOLS; BORON; CHEMICAL ANALYSIS; DILUTION; INDUCTIVELY COUPLED PLASMA; INDUCTIVELY COUPLED PLASMA MASS SPECTROMETRY; ISOTOPES; LASER ABLATION; MASS SPECTROMETERS;

ANALYTICAL RESULTS; BORON CONCENTRATIONS; ISOTOPE DILUTION TECHNIQUE; ISOTOPE DILUTIONS; LA-ICP-MS; LASER ABLATION INDUCTIVELY COUPLED PLASMA MASS SPECTROMETRIES (LA ICP MS); P-TYPE SILICON WAFERS; REFERENCE STANDARD;

SILICON WAFERS;

EID: 71649083723     PISSN: 00399140     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.talanta.2009.09.013     Document Type: Article

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