Magnetic Nanocrystals Modified Epoxy Photoresist for Microfabrication of AFM probes

Procedia Chemistry

Volumn 1, Issue 1, 2009, Pages 580-584

  Ingrosso, C ^a   Martin, C ^b,c   Llobera, A ^b   Perez Murano, F ^b   Innocenti, C ^d   Sangregorio, C ^d   Voigt, A ^e   Gruetzner, G ^e   Brugger, J ^c   Striccoli, M ^a   Agostiano, A ^a   Curri, M L ^a  

^a UNIVERSITY OF BARI   (Italy)

^b INSTITUTO DE MICROELECTRÓNICA DE BARCELONA   (Spain)

^c EPFL   (Switzerland)

^d UNIVERSITY OF FLORENCE   (Italy)

^e MICRO RESIST TECHNOLOGY GMBH   (Germany)

Author keywords

AFM probes; colloidal nanocrystals; epoxy photoresist; fabrication; magnetic nanocomposite; UV lithography

Indexed keywords

AFM PROBE; COLLOIDAL NANOCRYSTALS; EPOXY PHOTORESIST; MAGNETIC NANOCOMPOSITES; UV LITHOGRAPHY;

ASPECT RATIO; ATOMIC FORCE MICROSCOPY; FABRICATION; MAGNETIC MATERIALS; MAGNETIC PROPERTIES; MAGNETISM; NANOCOMPOSITES; NANOCRYSTALS; PHOTORESISTORS; PHOTORESISTS; PROBES; SURFACE TREATMENT;

LITHOGRAPHY;

EID: 71549163135     PISSN: 18766196     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1016/j.proche.2009.07.145     Document Type: Conference Paper

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