Diffraction processes in 3D photonic crystals based on thin opal films

Journal of Materials Science: Materials in Electronics

Volumn 20, Issue SUPPL. 1, 2009, Pages

  Baryshev, A V ^a,b   Khanikaev, A B ^a   Fujikawa, R ^a   Uchida, H ^a   Inoue, M ^a  

^a TOYOHASHI UNIVERSITY OF TECHNOLOGY   (Japan)

^b IOFFE INSTITUTE   (Russian Federation)

Author keywords

[No Author keywords available]

Indexed keywords

3D PHOTONIC CRYSTALS; BRAGG DIFFRACTION; CRYSTALLINE STRUCTURE; CRYSTALLOGRAPHIC PLANE; DIFFRACTION LOBE; DIFFRACTION PROCESS; FEE STRUCTURE; LINEARLY POLARIZED LIGHT; OPAL FILMS; PHOTONIC STOP BAND; POLARIZED LIGHT; REFLECTION SPECTRA; S-POLARIZED LIGHT; STOP-BANDS; STRONG ANISOTROPY;

DIFFRACTION; LIGHT POLARIZATION; LIGHT PROPAGATION; LIGHT REFLECTION; PHOTONIC CRYSTALS; SINGLE CRYSTALS;

LIGHT;

EID: 71149093481     PISSN: 09574522     EISSN: 1573482X     Source Type: Journal    
DOI: 10.1007/s10854-008-9659-4     Document Type: Conference Paper

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