Origin of photochemical modification of the resistivity of Ag(DMe-DCNQI)2 studied by X-ray absorption fine structure

Journal of Physical Chemistry C

Volumn 113, Issue 47, 2009, Pages 20476-20480

  Miyamoto, Takeshi ^a   Kitajima, Yoshinori ^b   Sugawara, Hideyuki ^a   Naito, Toshio ^a   Inabe, Tamotsu ^a   Asakura, Kiyotaka ^a  

^a HOKKAIDO UNIVERSITY   (Japan)

^b INSTITUTE OF MATERIALS STRUCTURE SCIENCE   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ACTIVATION BARRIERS; BOND DISTANCE; CHARGE-TRANSFER SALTS; COLUMNAR STRUCTURES; CONDUCTION ELECTRONS; CONDUCTION PROPERTIES; COORDINATION NUMBER; DOMAIN BOUNDARY; ELECTRON TRANSFER; EXAFS; EXTENDED X-RAY ABSORPTION FINE STRUCTURE DATUM; LOCAL STRUCTURE; METALLIC CONDUCTION; PHOTOCHEMICAL MODIFICATIONS; PHOTOINDUCED CHANGE; PHOTOPRODUCTS; PROMISING MATERIALS; RADICAL ANIONS; REDOX MECHANISM; SEMICONDUCTIVE BEHAVIOR; X RAY ABSORPTION FINE STRUCTURES; X-RAY ABSORPTION FINE STRUCTURE TECHNIQUES; X-RAY ABSORPTION NEAR-EDGE STRUCTURE; XANES;

ABSORPTION; COORDINATION REACTIONS; ELECTRONS; FREE RADICAL REACTIONS; INSULATION; NEGATIVE IONS; POSITIVE IONS; X RAY ABSORPTION;

SILVER;

EID: 71049114224     PISSN: 19327447     EISSN: 19327455     Source Type: Journal    
DOI: 10.1021/jp907024p     Document Type: Article

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