Thin nanocrystalline TiO2-SnO2 sprayed films: Influence of the dopant concentration, substrate and thermal treatment on the phase composition and crystallites sizes

Journal of Alloys and Compounds

Volumn 489, Issue 1, 2010, Pages 257-261

  Stambolova, I ^a   Blaskov, V ^a   Vassilev, S ^b   Shipochka, M ^a   Dushkin, C ^c  

^a INSTITUTE OF GENERAL AND INORGANIC CHEMISTRY   (Bulgaria)

^b BULGARIAN ACADEMY OF SCIENCES   (Bulgaria)

^c UNIVERSITY OF SOFIA   (Bulgaria)

Author keywords

Nanostructured materials; Thin films; X ray diffraction

Indexed keywords

ANATASE PHASE; COMBINED EFFECT; DIFFRACTION PEAKS; DOPANT CONCENTRATIONS; NANOCRYSTALLINE TIO; QUARTZ SUBSTRATE; RUTILE PHASE; SPRAY PYROLYSIS METHOD; STAINLESS STEEL SUBSTRATES; THERMAL TREATMENT; TITANIA FILMS; TREATMENT TEMPERATURE; XPS; XRD;

CHROMIUM; CRYSTALLITES; DIFFRACTION; HEAT TREATMENT; IRON; METALLIC FILMS; NANOCRYSTALLINE ALLOYS; NANOSTRUCTURED MATERIALS; OXIDE MINERALS; QUARTZ; RAMAN SPECTROSCOPY; SEMICONDUCTOR DOPING; SILICON COMPOUNDS; SPRAY PYROLYSIS; STAINLESS STEEL; THIN FILMS; TITANIUM DIOXIDE; TITANIUM OXIDES; X RAY DIFFRACTION;

SUBSTRATES;

EID: 70649100009     PISSN: 09258388     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jallcom.2009.09.066     Document Type: Article

References (30)

1. Hoffman M.R., Martin S.I., Choi W., and Bahnemann D.W. Chem. Rev. 95 (1995) 69-96
2. Miyauchi M., Nakajama A., Watanabe T., and Hashimoto K. Chem. Mater. 14 (2002) 2812-2816
3. Traversa E., Gnoppi G., and Montenegro A. Sens. Actuators B 31 (1996) 59-70
4. Shen Y., Tao J., Gu F., Huang L., Bao J., Zhang J., and Dai N. J. Alloys Compd. 474 (2009) 326-329
5. Garzella G., Comini E., Tempesti E., Frigeri C., and Sberveglieri G. Sens. Actuators B 68 (2000) 189-193
6. Habibi M.H., Nasr-Estafani M., and Egerton T.A. J. Mater. Sci. 42 (2007) 6027-6035
7. Liu K., Wu X., Wang B., and Liu Q. Mater. Res. Bull. 37 (2002) 2255-2562
8. Lin J., Yu J.C., Lo D., and Lam S.K. J. Catal. 183 (1999) 368-372
9. Martinez J., Acosta D.R., and Cedillo G. Thin Solid Films 490 (2005) 118-123
10. Gupta P., Gergintchev Z., Schipanski D., and Vyas P.D. Sens. Actuators B 56 (1999) 65-72
11. Radecka M., Zakrzewska K., and Rekas M. Sens. Actuators B 47 (1998) 194-204
12. Tai W.-P., and Oh J.-H. Sens. Actuators B 85 (2002) 154-157
13. Zakrzewska K. Thin Solid Films 391 (2001) 229-238
14. Akurati K.K., Vital A., Hany R., Bommer B., Graule T., and Winterer M. Int. J. Photoenergy 7 (2005) 153-161
15. Yang J., Li D., Wang X., Yang L., and Lu L. Solid State Chem. 165 (2002) 193-198
16. Mahanty S., Roy S., and Sen S. J. Crystal Growth 261 (2004) 77-88
17. Shi Z.M., Yan L., Jin L.N., Lu X.M., and Chao G. J. Non-Cryst. Sol. 353 (2007) 2171-2178
18. Kaya C., Kaya F., Su B., Thomas B., and Boccaccini A.R. Surf. Coat. Technol. 191 (2005) 303-310
19. Fallet M., Mahdjoub H., Gauter B., and Bauer J.-P. J. Non-Cryst. Sol. 293-295 (2001) 527-533
20. Kumar K.N., Fray D.J., Nair J., Mizukami F., and Okubo T. Scripta Mater. 57 (2007) 771-774
21. Peshev P., Stambolova I., Vassilev S., Stefanov P., Blaskov V., Starbova K., and Starbov N. Mater. Sci. Eng. B 97 (2003) 106-109
22. Yoshinaka M., Hirota K., and Yamaguchi O. J. Am. Ceram. Soc. 80 (1997) 2749-2753
23. Nikolic L., Radonic L., and Srdic V.V. Ceram. Int. 31 (2005) 261-266
24. Zhang H., and Banfield J.F. J. Phys. Chem. 104 (2000) 3481-3487
25. Stambolova I., and Konstantinov K. J. Mater. Sci. 31 (1996) 6207-6213
26. Stambolova I., Konstantinov K., Vassilev S., Peshev P., and Tsacheva Ts. Mater. Chem. Phys. 63 (2000) 104-109
27. MacKenzie K.J.D. Trans. J. Br. Ceram. 74 (1975) 29-34
28. Zhang Y.-H., and Reller A. Mater. Sci. Eng. C 19 (2002) 323-326
29. Gennari F.C., and Pasquevich D.M. J. Mater. Sci. 33 (1998) 1571-1578
30. Messing G.L., Zhang S.-C., and Jayanthi G.V. J. Am. Ceram. Soc. 76 (1993) 2707-2726