Etching behavior of Pb ion from PbO-B2O3-SiO 2 glasses in HNO3 solution

Metals and Materials International

Volumn 15, Issue 5, 2009, Pages 857-862

  Kim, Jaemin ^a,b   Hwang, Seongjin ^a   Lee, Chongmu ^a   Kim, Hyungsun ^a  

^a Inha University   (South Korea)

^b Presently at DAION Co   (South Korea)

Author keywords

Acid etching; Bridging oxygen (BO); Non bridging oxygen (NBO); PbO B2O3 SiO2 glass

Indexed keywords

DISSOLUTION; ETCHING; GLASS; IONS; LEAD OXIDE; OXYGEN; SILICA; SILICON; SILICON OXIDES; SURFACE STRUCTURE; X RAY PHOTOELECTRON SPECTROSCOPY;

ACID ETCHING; BRIDGING OXYGEN; DISSOLUTION BEHAVIOR; ETCHING MECHANISM; ETCHING SOLUTIONS; INDUCTIVE COUPLED PLASMA; NON-BRIDGING OXYGEN; QUANTITATIVE STUDY;

LEAD;

EID: 70450277417     PISSN: 15989623     EISSN: None     Source Type: Journal    
DOI: 10.1007/s12540-009-0857-7     Document Type: Article

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