Morphological effects on the plasma-induced emission properties of large area ZnO nanorod arrays

Journal of Physics D: Applied Physics

Volumn 42, Issue 21, 2009, Pages

  Liao, Qingliang ^a   Qi, Junjie ^a   Yang, Ya ^a   Huang, Yunhua ^a   Zhang, Yue ^a   Zhang, Zheng ^a   Xia, Liansheng ^b  

^a UNIVERSITY OF SCIENCE AND TECHNOLOGY BEIJING   (China)

^b RESEARCH CENTER OF LASER FUSION   (China)

Author keywords

[No Author keywords available]

Indexed keywords

DESIGN STRATEGIES; EMISSION CURRENT; EMISSION CURRENT DENSITY; EMISSION PROPERTIES; HIGH DENSITY; HYDROTHERMAL METHODS; MORPHOLOGICAL EFFECTS; NANOROD ARRAYS; NANOROD DENSITY; PLASMA-INDUCED; PULSED ELECTRIC FIELD; SCREENING EFFECT; SURFACE PLASMA; WELL-ALIGNED; ZNO NANOROD ARRAYS;

ASPECT RATIO; ELECTRIC FIELDS; ELECTRIC PROPERTIES; MORPHOLOGY; PLASMAS; SEMICONDUCTING ZINC COMPOUNDS; ZINC OXIDE;

NANORODS;

EID: 70450203644     PISSN: 00223727     EISSN: 13616463     Source Type: Journal    
DOI: 10.1088/0022-3727/42/21/215203     Document Type: Article

References (23)

1. She J, Xiao Z, Yang Y, Deng S, Chen J, Yang G and Xu N 2008 ACS Nano 2 2015
2. Huang Y, Zhang Y, Gu Y, Bai X, Qi J, Liao Q and Liu J 2007 J. Phys. Chem. C 111 9039
3. Li C, Hou K, Yang X, Qu K, Lei W, Zhang X, Wang B and Sun X 2008 Appl. Phys. Lett. 93 233508
4. Wei A, Sun X, Xu C, Dong Z, Yu M and Huang W 2006 Appl. Phys. Lett. 88 213102
5. Li C, Di Y, Lei W, Yin Q, Zhang X and Zhao Z 2008 J. Phys. Chem. C 112 13447
6. Zhao Q, Zhang H, Zhu Y, Feng S, Sun X, Xu J and Yu D 2005 Appl. Phys. Lett. 86 203115
7. Park C, Choi D, Yoo J, Yi G and Lee C 2007 Appl. Phys. Lett. 90 083107
8. Yang Y, Wang B, Xu N and Yang G 2007 Appl. Phys. Lett. 91 163502
9. Saveliev Y M, Sibbett W and Parkes D M 2003 J. Appl. Phys. 94 5776
10. Vayssieres L 2003 Adv. Mater. 15 464
11. Zhang Y, Lu F, Wang Z and Zhang L 2007 J. Phys. Chem. C 111 4519
12. Yan X, Li Z, Chen R and Gao W 2008 Cryst. Growth Des. 8 2406
13. Liao Q, Yang Y, Xia L, Qi J, Zhang Y, Huang Y and Qin Z 2008 Phys. Plasmas 15 114505
14. Parker P K, Anderson R E and Duncan C V 1974 J. Appl. Phys. 45 2463
15. Miller R B 1998 J. Appl. Phys. 84 3880
16. Krasik Y E, Dunaevsky A, Krokhmal A, Felsteiner J, Gunin A V, Pegel I V and Korovin S D 2001 J. Appl. Phys. 89 2379
17. Shiffle D, LaCour M, Golby K, Sena M, Mitchell M, Haworth M, Hendricks K and Spencer T 2001 IEEE Trans. Plasma Sci. 29 445
18. Liao Q, Zhang Y, Huang Y, Qi J, Gao Z, Xia L and Zhang H 2007 Appl. Phys. Lett. 90 151504
19. Liao Q, Zhang Y, Huang Y, Qi J, Xia L, Gao Z and Gu Y 2007 J. Phys. D: Appl. Phys. 40 3456
20. Jo S, Tu Y, Huang Z, Carnahan D, Wang D and Ren Z 2003 Appl. Phys. Lett. 82 3520
21. Nilsson L, Groening O, Emmenegger C, Kuettel O, Schaller E, Schlapbach L, Kind H, Bonard J and Kern K 2000 Appl. Phys. Lett. 76 2071
22. Huang Y, Zhang Y, Liu L, Fan S, Wei Y and He J 2006 J. Nanosci. Nanotechnol. 6 787
23. Zhu Y, Zhang H, Sun X, Feng S, Xu J, Zhao Q, Xiang B, Wang R and Yu D 2003 Appl. Phys. Lett. 83 144