Increase of maximum detectable slope with optical profilers: Theory and applicative examples

Proceedings of the 7th International Conference European Society for Precision Engineering and Nanotechnology, EUSPEN 2007

Volumn 1, Issue , 2007, Pages 333-336

  Marinello, F ^a,b   Bariani, P ^c   Carmignato, S ^a   Savio, E ^a   De Chiffre, L ^d   Bossard, M ^c  

^a UNIVERSITY OF PADOVA   (Italy)

^b CIVEN Coordinamento Interuniversitario Veneto per le Nanotecnologie ^*  (Italy)

^c Schaefer Italia SRL   (Italy)

^d TECHNICAL UNIVERSITY OF DENMARK   (Denmark)

Author keywords

[No Author keywords available]

Indexed keywords

OPTICAL PROFILER;

EID: 70449613049     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (3)

1. Schwenke H., Neuschaefer-Rube U., Pfeifer T. and Kunzmann H., Optical methods for dimensional metrology in production engineering, CIRP Ann. Manuf. Technol., 51, 685-699, 2002
2. Garnaes J. et al., Determination of sub-micrometer high aspect ratio grating profiles Advanced Characterization Techniques for Optics, Semiconductors, and Nanotechnologies II, Proc. SPIE, 5878, 23-31, 2005.
3. Marinello F., Bariani P., Pasquini A., De Chiffre L., Bossard M. and Picotto G.B., Increase of maximum detectable slope with optical profilers, through controlled tilting and image processing, Meas. Sci. Technol., 18/2, 384-389, 2007.