Wide tunable ultraviolet random lasing action from ZnMgo thin films

Journal of Crystal Growth

Volumn 312, Issue 1, 2009, Pages 16-18

  Ying Yang, Hui ^a   Fung Yu, Siu ^a   Ping Lau, Shu ^a  

^a NANYANG TECHNOLOGICAL UNIVERSITY   (Singapore)

Author keywords

Random lasing; Thin film; Wavelength tunable; ZnMgO; ZnO

Indexed keywords

EMISSION ENERGIES; FILTERED CATHODIC VACUUM ARC TECHNIQUES; LASING THRESHOLD; POLYCRYSTALLINE THIN FILM; RANDOM LASING; SILICON SUBSTRATES; TUNABLE ULTRAVIOLETS; TUNABLE WAVELENGTH; WAVELENGTH TUNABLE; ZNMGO; ZNO;

AMORPHOUS FILMS; SEMICONDUCTING ZINC COMPOUNDS; THIN FILM DEVICES; THIN FILMS; VACUUM APPLICATIONS; ZINC; ZINC OXIDE;

SEMICONDUCTING SILICON COMPOUNDS;

EID: 70449504724     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jcrysgro.2009.10.004     Document Type: Article

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