Oxidation study of InN/sapphire (0001) film using in-situ synchrotron X-ray scattering

Physica Status Solidi (A) Applied Research

Volumn 201, Issue 12, 2004, Pages 2777-2781

  Lee, Ik Jae ^a   Kim, Jae Yong ^a   Hur, Tae Bong ^b   Kim, Hyung Kook ^b  

^a Pohang University of Science and Technology (POSTECH)   (South Korea)

^b Pusan National University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

HEATING; LATTICE CONSTANTS; MAGNETRON SPUTTERING; POLYCRYSTALLINE MATERIALS; SAPPHIRE; SYNCHROTRONS; THICK FILMS; X RAY DIFFRACTION ANALYSIS; CRYSTAL STRUCTURE; MATHEMATICAL MODELS; OPTOELECTRONIC DEVICES; OXIDATION; SEMICONDUCTOR MATERIALS; X RAY SCATTERING;

STRUCTURAL PROPERTIES; THERMAL HEATING; THERMAL OXIDATION; X RAY REFLECTIVITY; OXIDE LAYER; OXIDIZING ATMOSPHERE; POTENTIAL APPLICATIONS;

INDIUM COMPOUNDS;

EID: 7044226233     PISSN: 00318965     EISSN: None     Source Type: Journal    
DOI: 10.1002/pssa.200405025     Document Type: Conference Paper

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