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Volumn 19, Issue 9, 2009, Pages
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Optimization of silicon oxynitrides by plasma-enhanced chemical vapor deposition for an interferometric biosensor
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Author keywords
[No Author keywords available]
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Indexed keywords
ADSORPTION REACTION;
BIOCHEMICAL REACTIONS;
BOVINE SERUM ALBUMINS;
CLAD LAYER;
GAS FLOWRATE;
GAS FLOWS;
GAS-FLOW RATIO;
INTERFEROMETRIC SENSOR;
MACH-ZEHNDER;
RF-POWER;
SILICON OXYNITRIDE LAYERS;
SILICON OXYNITRIDES;
ADSORPTION;
AERODYNAMICS;
BIOSENSORS;
BODY FLUIDS;
FLOW OF GASES;
INTEGRATED OPTOELECTRONICS;
INTERFEROMETRY;
OPTIMIZATION;
PLASMA DEPOSITION;
SILICON NITRIDE;
PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;
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EID: 70350680938
PISSN: 09601317
EISSN: 13616439
Source Type: Journal
DOI: 10.1088/0960-1317/19/9/095007 Document Type: Article |
Times cited : (8)
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References (25)
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