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Volumn 95, Issue 16, 2009, Pages

Identification and lattice location of oxygen impurities in α-Si 3 N4

(8) Idrobo, J C a,b,c Oxley, M P a,b Walkosz, W c Klie, R F c Ogut S c Mikijelj, B d Pennycook, S J a,b Pantelides, S T a,b

a VANDERBILT UNIVERSITY (United States)

b OAK RIDGE NATIONAL LABORATORY (United States)

c UNIVERSITY OF ILLINOIS AT CHICAGO (United States)

d Ceradyne Inc (United States)

Author keywords

[No Author keywords available]

Indexed keywords

BULK MATERIALS; DIRECT IMAGING; ENERGY-LOSS SPECTROSCOPY; FIRST-PRINCIPLES CALCULATION; INTERSTITIALS; LATTICE LOCATIONS; LIGHT ELEMENTS; OXYGEN IMPURITY;

CHEMICAL ELEMENTS; ELECTRON ENERGY LOSS SPECTROSCOPY; IMPURITIES; OXYGEN; STRUCTURAL CERAMICS;

SILICON;

EID: 70350401850 PISSN: 00036951 EISSN: None Source Type: Journal
DOI: 10.1063/1.3250922 Document Type: Article

Times cited : (9)

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