X-ray diffraction study of nanocrystalline titania thin films prepared by pulsed laser deposition

Journal of Nanoscience and Nanotechnology

Volumn 9, Issue 9, 2009, Pages 5311-5314

  Murugesan, S ^a   Kuppusami, P ^a   Mohandas, E ^a  

^a INDIRA GANDHI CENTRE FOR ATOMIC RESEARCH   (India)

Author keywords

Pulsed laser deposition; Rietveld analysis; Thin film; Titania; X ray diffraction

Indexed keywords

ANATASE FILMS; ANATASE PHASE; BASE PRESSURE; CRYSTALLINE QUALITY; NANOCRYSTALLINE TITANIA; OXYGEN PARTIAL PRESSURE; RUTILE AND ANATASE; RUTILE FILMS; RUTILE PHASE; SUBSTRATE TEMPERATURE; TEMPERATURE RANGE; TITANIA; X-RAY DIFFRACTION STUDIES;

CRYSTALLITE SIZE; DEPOSITION; DIFFRACTION; FILM PREPARATION; LASERS; OXIDE MINERALS; OXYGEN; PULSED LASER DEPOSITION; RIETVELD ANALYSIS; RIETVELD METHOD; THIN FILM DEVICES; THIN FILMS; TITANIUM DIOXIDE; TITANIUM OXIDES; X RAY ANALYSIS; X RAY DIFFRACTION;

AMORPHOUS FILMS;

EID: 70350266343     PISSN: 15334880     EISSN: None     Source Type: Journal    
DOI: 10.1166/jnn.2009.1132     Document Type: Conference Paper

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